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Plasma processing

Plasma processing is a plasma-based material processing technology that aims at modifying the chemical and physical properties of a surface.

Plasma processing techniques include:


Related topics are plasma chemistry, chemical vapor deposition, and physical vapor deposition processes like sputter deposition, plasma iondoping, vacuum plasmaspraying, and reactive ion etching.

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This article is adapted from the Wikipedia article Plasma processing, written by its contributors and licensed under CC BY-SA 4.0. Fathomly has changed the layout, removed citation markers, navigation and maintenance notices, and adjusted punctuation. This adapted version is shared under the same license. For references, see the original article.

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