Patent classification
A patent classification is a system for examiners of patent offices or other people to categorize (code) documents, such as published patent applications, according to the technical features of their content. Patent classifications make it feasible to search quickly for documents about earlier disclosures similar to or related to the invention for which a patent is applied, and to track technological trends in patent applications.
Searches based on patent classifications can identify documents of different languages by using the codes (classes) of the system, rather than words. Patent classification systems were originally developed for sorting paper documents, but are nowadays used for searching patent databases.
01Main classification schemes
The International Patent Classification (IPC) is agreed upon internationally. The United States Patent Classification (USPC) is fixed by the United States Patent and Trademark Office (USPTO). An enterprise fixed the Derwent classification system. The German Patent Classification (DPK) was fixed by the German Patent Office (Deutsches Patentamt).
In October 2010, the European Patent Office (EPO) and USPTO launched a joint project to create the Cooperative Patent Classification (CPC) to harmonise the patent classifications systems between the two offices. From 2013, CPC replaced the European Classification (ECLA), which was based on the IPC but adapted by the EPO.
Class Schedule Classification
The United States Patent and Trademark Office index patents by class and subclasses.
United States Classification (USPC) system
After implementing the Cooperative Patent Classification (CPC), only the plant and design classification material is updated within the USPC.
Sources and credits
This article is adapted from the Wikipedia article “Patent classification”, written by its contributors and licensed under CC BY-SA 4.0. Fathomly has changed the layout, removed citation markers, navigation and maintenance notices, and adjusted punctuation. This adapted version is shared under the same license. For references, see the original article.
Images, from Wikimedia Commons:
- Patclass.png by United States Patent and Trademark Office, CC0
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